New York, NY -- (SBWire) -- 05/09/2019 --The growth of the market for Dry Film Photoresist market is driven by the increasing High demand of image transfer process
This report on Dry Film Photoresist Market offers a detailed analysis of the trends along with the prospective growth of the same in the forecasted period. It evaluates the pricing, demand, growth, revenue, size and gross margin of the industry. For this study, the historical data has been collected from the years 2016 and 2017, taking the year 2018 as the base year and drawing a forecast for the years 2019 to 2026. The industry has seen a stable growth recently and its demand is projected to rise rapidly in the future.
The Dry Film Photoresist Market is forecast to grow from USD 4.01 billion in 2018 to USD 5.14 billion by 2026, at a CAGR of 3.1 %, during the forecast period. Advancements in technology which is increasing the utilization of Nano devices is the major driving factor of the market.
The Dry Film Photoresist Market is forecast to show significant growth due to the increase in implementation photo-resist technology and growing demand of the technology in the IC's and semiconductor markets. The rising need for Nano devices is helping the market.
Some of the major key players in the photoresist market are Asahi Kasei (Japan), TOKYO OHKA KOGYO CO., LTD. (Japan), JSR Corporation (Japan), The Dow Chemical Company (U.S.), Fujifilm Electronics Material Co., Ltd. (Japan), Shin-Etsu Chemical Co., Ltd. (Japan), Sumitomo Chemicals Co., LTD. (Japan), HITACHI Chemical (Japan) , GREAT EASTERN RESINS INDUSTRIAL CO., LTD. (Taiwan) and AZ Electronic Materials (Luxembourg)
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A photoresist is a light-sensitive material used in the process of photoengraving or photolithography which is applied to a surface to produce the desired pattern to be imaged. It is used in semiconductors & ICs, printed circuit boards, LCDs and others application. The applications of the photoresist technology is driving the market worldwide.
Further key findings from the report suggest
- The Dry Film Photoresist Market is forecast to grow from USD 4.01 billion in 2018 to USD 5.14 billion by 2026, at a CAGR of 3.1 %, during the forecast period. Advancements in technology which is increasing the utilization of Nano devices is the major driving factor of the market.
- Based on Category, the market is divided as ArF immersion, I-line, G-line, ArF, KrF. The ArF immersion sector of the photoresist market is estimated to grow at the highest CAGR of 3% during the forecast period. ArF immersion has superior properties like low defects, high resolution and narrow wavelength. It also prevents the requirement for other techniques like strong resolution enhancement.
- Based on Types, the market is segmented as remover, anti-reflective coatings and developer. Anti-reflection (AR) coating is a kind of optical coating used in the surface of optical elements to reduce reflection. since less light is lost due to reflection, this improves the efficiency
- The Implementation types are Semiconductor and IC's, Printed circuit boards and LCD's. The ICs application & semiconductors sector is estimated for the largest share of 33% of the global photoresist market. This sector is estimated to continue to dominate during the forecast period.
- The Dry Film Photoresist Market is segmented across five regions, namely, North America, Asia-Pacific (APAC), Europe, the Middle East and Africa (MEA), and Latin America. APAC is forecasted to dominate the market with a highest share of 34 % in 2018.
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Some of the key findings from our Dry Film Photoresist Market forecast report
This report gives an analysis of the historical data and trends to draw a forecast of the potential growth Dry Film Photoresist Market exhibits a potential for growth and technological advancement primarily in its uses in rubber industries and shall experience a stable growth in the next five years. The historical analysis suggest certain trends that the industry might experience and the prospects of growth during the forecasted years. This study also offers vital insights into the industry to provide the fields that are the most beneficial for investment and gives a competitive strategy that is most advantageous in the industry.
Segments covered in the report:
For the purpose of this report, the market has been segmented on the basis of Category, Type, Implementation and region:
Category Outlook (Revenue, USD Million; 2018-2026)
- G-line
- I-line
- ArF immersion
- KrF
- ArF dry
Type Outlook (Revenue, USD Million; 2018-2026)
- Remover
- Anti-reflective coating
- Developer
Implementation Outlook (Revenue, USD Million; 2018-2026)
- Semiconductor &Ic's
- LCD's
- Printed circuit board
Regional Outlook (Volume, Kilo Tons; 2016-2026 and Revenue, USD Million; 2016-2026)
- North America
o U.S.
- Europe
o France
o UK
- Asia Pacific
o China
o India
o Japan
- Latin America
o Brazil
- MEA
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Dry Film Photoresist Market in-Depth Analysis by Top Players: Shin-Etsu Chemical, Sumitomo Chemicals, the Dow Chemical : Market Size by 2026 - USD 5.14 Billion : Market G
This Dry Film Photoresist Market report covers the status of import and export, supply chain management, distribution channels, production volume, production capacity, product price, profit, sale and others elements.