Atomic Layer Deposition Market Is Expected to Rise at a Remarkable CAGR During 2015 to 2021
Atomic layer deposition (ALD) is a thin layer deposition process that is based on the chronological exploitation of a gas phase chemical course. ALD is considered a subclass of chemical vapor deposition. The majority of ALD reactions use two chemicals, usually called precursors. ALD is mostly used to produce competent semiconductors. Nanotechnology, microelectronics, electronic displays, optical data storage devices, electronic components, and the bio-medical field are the key applications of atomic layer disposition market.
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